Samsung 3 nm GAAFET Node Delayed to 2024

Samsung's ambitious 3 nm silicon fabrication node that leverages the Gate All Around FET transistors, has reportedly been delayed to 2024. The company brands this specific node as 3GAE. 2024 is the earliest date when Samsung will be able to mass-produce chips on 3GAE, which means the company, along with Intel, will begin to fall significantly behind TSMC on foundry technology. The Taiwanese semiconductor fabrication giant will target 2 nm-class nodes around 2024, which leverages EUV multi-patterning, extensive use of cobalt in contacts and interconnects, germanium doped channels, and other in-house innovations. With Intel's foundry technology development slowing to a crawl in the sub-10 nm domain, Samsung is the only viable alternative to TSMC for cutting-edge logic chip manufacturing.