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Intel Courts TSMC 6nm and 3nm Nodes for Future Xe GPU Generations

Intel is rumored to be aligning its future-generation Xe GPU development with TSMC's node development cycle, with the company reportedly negotiating with the Taiwanese foundry for 6 nm and 3 nm allocation for its large Xe GPUs. Intel's first Xe discrete GPUs for the market, however, are reportedly built on the company's own 10 nm+ silicon fabrication process.

While Intel's fascination with TSMC 3 nm is understandable, seeking out TSMC's 6 nm node raises eyebrows. Internally referred to as "N6," the 6 nm silicon fabrication node at TSMC is expected to go live either towards the end of 2020 or early 2021, which is when Intel's 10 nm+ node is expected to pick up volume production, beginning with the company's "Tiger Lake" processors. Perhaps a decision has been made internally to ensure that Xe doesn't eat too much into Intel's own foundry capacities meant for processor manufacturing, and to instead outsource Xe manufacturing to third-party foundries like TSMC and Samsung eventually. Way back in April 2019 it was rumored that Intel was evaluating Samsung as a foundry partner for Xe.

UNISOC Launches Next-Gen 5G SoC T7520 on 6 nm EUV Manufacturing Node

UNISOC, a leading global supplier of mobile communication and IoT chipsets, today officially launched its new-generation 5G SoC mobile platform - T7520. Using cutting-edge process technology, T7520 enables an optimized 5G experience with substantially enhanced AI computing and multimedia imaging processing capabilities while lowering power consumption.

T7520 is UNISOC's second-generation 5G smartphone platform. Built on a 6 nm EUV process technology and empowered by some of the latest design techniques, it offers substantially enhanced performance at a lower level of power consumption than ever.

TSMC Starts Shipping its 7nm+ Node Based on EUV Technology

TSMC today announced that its seven-nanometer plus (N7+), the industry's first commercially available Extreme Ultraviolet (EUV) lithography technology, is delivering customer products to market in high volume. The N7+ process with EUV technology is built on TSMC's successful 7 nm node and paves the way for 6 nm and more advanced technologies.

The N7+ volume production is one of the fastest on record. N7+, which began volume production in the second quarter of 2019, is matching yields similar to the original N7 process that has been in volume production for more than one year.

AMD Designing Zen 4 for 2021, Zen 3 Completes Design Phase, out in 2020

AMD in its 2nd generation EPYC processor launch event announced that it has completed the design phase of its next-generation "Zen 3" CPU microarchitecture, and is currently working on its successor, the "Zen 4." AMD debuted its "Zen 2" microarchitecture with the client-segment 3rd generation Ryzen desktop processor family, it made its enterprise debut with the 2nd generation EPYC. This is the first x86 CPU microarchitecture designed for the 7 nanometer silicon fabrication process, and is being built on a 7 nm DUV (deep ultraviolet) node at TSMC. It brings about double-digit percentage IPC improvements over "Zen+."

The "Zen 3" microarchitecture is designed for the next big process technology change within 7 nm, EUV (extreme ultraviolet), which allows significant increases in transistor densities, and could facilitate big improvements in energy-efficiency that could be leveraged to increase clock-speeds and performance. It could also feature new ISA instruction-sets. With "Zen 3" passing design phase, AMD will work on prototyping and testing it. The first "Zen 3" products could debut in 2020. "Zen 4" is being designed for a different era.

Samsung Announces Breakthrough in Building Blocks of 3nm Circuits, Updates Roadmap

Samsung Electronics Co., Ltd., a world leader in advanced semiconductor technology, today announced its ongoing commitment to foundry innovation and service at the Samsung Foundry Forum 2019 USA, providing the silicon community with wide-ranging updates on technology advances that support the most demanding applications of today and tomorrow.

The event, held today in Santa Clara, California, features top Samsung executives and industry experts reviewing progress on semiconductor technologies and foundry platform solutions that enable developments in artificial intelligence (AI), machine learning, 5G networking, automotive, the Internet of Things (IoT), advanced data centers and many other domains.

TSMC Unveils 6-nanometer Process

TSMC today announced its 6-nanometer (N6) process, which provides a significant enhancement of its industry-leading N7 technology and offers customers a highly competitive performance-to-cost advantage as well as fast time-to-market with direct migration from N7-based designs. By leveraging the new capabilities in extreme ultraviolet (EUV) lithography gained from the N7+ technology currently in risk production, TSMC's N6 process delivers 18% higher logic density over the N7 process. At the same time, its design rules are fully compatible with TSMC's proven N7 technology, allowing its comprehensive design ecosystem to be reused. As a result, it offers a seamless migration path with a fast design cycle time with very limited engineering resources for customers to achieve the product benefits from the new technology offering.

Scheduled for risk production in the first quarter of 2020, TSMC's N6 technology provides customers with additional cost-effective benefits while extending the industry-leading power and performance from the 7nm family for a broad array of applications, ranging from high-to-mid end mobile, consumer applications, AI, networking, 5G infrastructure, GPU, and high-performance computing.
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